Epitaxial Regrowth of Ne-Implanted and Kr-Implanted Amorphous Silicon

Wittmer, M.; Roth, J.; Revesz, P.; Mayer, J.W.

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Epitaxial Regrowth of Ne-Implanted and Kr-Implanted Amorphous Silicon

Wittmer, M., Roth, J., Revesz, P., & Mayer, J. (1978). Epitaxial Regrowth of Ne-Implanted and Kr-Implanted Amorphous Silicon. Journal of Applied Physics, 49, 10, 5207-5212.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-BC1B-7 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-BC1C-5

Genre: Journal Article

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Creators:
Wittmer, M.¹, Author
Roth, J.², Author
Revesz, P.¹, Author
Mayer, J.W.¹, Author

Affiliations:
1External Organizations, ou_persistent22
2Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288

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Dates: Date issued: 1978

Publication Status: Issued

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Title: Journal of Applied Physics

Source Genre: Journal

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Pages: - Volume / Issue: 49, 10 Sequence Number: - Start / End Page: 5207 - 5212 Identifier: -