Epitaxial Regrowth of Ar-Implanted Amorphous Silicon

Wittmer, M.; Roth, J.; Revesz, P.; Mayer, J.W.

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Epitaxial Regrowth of Ar-Implanted Amorphous Silicon

Wittmer, M., Roth, J., Revesz, P., & Mayer, J. (1978). Epitaxial Regrowth of Ar-Implanted Amorphous Silicon. Journal of Applied Physics, 49, 10, 5199-5206.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-BC1D-3 Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-BC1E-1

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Urheber:
Wittmer, M.¹, Autor
Roth, J.², Autor
Revesz, P.¹, Autor
Mayer, J.W.¹, Autor

Affiliations:
1External Organizations, ou_persistent22
2Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288