A Comparison of Surface Analysis Using Ion Scattering, Ionproduced Photons, and 
Secondary Ion Emission

MacDonald, R.J.; Heiland, W.; Taglauer, E.

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A Comparison of Surface Analysis Using Ion Scattering, Ionproduced Photons, and Secondary Ion Emission

MacDonald, R., Heiland, W., & Taglauer, E. (1978). A Comparison of Surface Analysis Using Ion Scattering, Ionproduced Photons, and Secondary Ion Emission. Applied Physics Letters, 33, 7, 576-578.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-BCFD-B Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-BCFE-9

Genre: Journal Article

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Creators:
MacDonald, R.J.¹, Author
Heiland, W.^{2, 3}, Author
Taglauer, E.², Author

Affiliations:
1External Organizations, ou_persistent22
2Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
3Experimental Plasma Physics 2 (E2), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856292

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Dates: Date issued: 1978

Publication Status: Issued

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Title: Applied Physics Letters

Source Genre: Journal

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Pages: - Volume / Issue: 33, 7 Sequence Number: - Start / End Page: 576 - 578 Identifier: -