A High Yield RF Plasma Source for Neutral Beam Injection Systems

Kraus, W.; Van Ingen, A.M.; Kaufmann, M.; Nijsen-Vis, A.; Klippel, H.T.; ), (Eds.

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A High Yield RF Plasma Source for Neutral Beam Injection Systems

Kraus, W., Van Ingen, A., Kaufmann, M., Nijsen-Vis, A., Klippel, H., & ), (. (1989). A High Yield RF Plasma Source for Neutral Beam Injection Systems. Fusion Technology 1988, Vol. 1, 495-498.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-C1D0-C Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-C1D1-A

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Creators:
Kraus, W.¹, Author
Van Ingen, A.M.², Author
Kaufmann, M.³, Author
Nijsen-Vis, A.², Author
Klippel, H.T.², Author
), (Eds.², Author

Affiliations:
1Technology (TE), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856318
2External Organizations, ou_persistent22
3Experimental Plasma Physics 1 (E1), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856295

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Dates: Date issued: 1989

Publication Status: Issued

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Title: 15.Symposium on Fusion Technology

Place of Event: Amsterdam Utrecht (NL)

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Title: Fusion Technology 1988

Source Genre: Journal

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Publ. Info: North-Holland Publ.

Pages: - Volume / Issue: Vol. 1 Sequence Number: - Start / End Page: 495 - 498 Identifier: -