English
 
Help Privacy Policy Disclaimer
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT
  Plasma Deposition of Thin Hydrogenated Carbon Films in an Experimental ECR Device

Jacob, W., D'Agostino, R., Boutard, D., Dose, V., Koch, A., Moeller, W., et al. (1989). Plasma Deposition of Thin Hydrogenated Carbon Films in an Experimental ECR Device. 9.International Symposium on Plasma Chemistry, Vol. 3, 1826-1831.

Item is

Files

show Files

Locators

show

Creators

show
hide
 Creators:
Jacob, W.1, Author              
D'Agostino, R.2, Author
Boutard, D.2, Author
Dose, V.1, 3, Author              
Koch, A.2, Author
Moeller, W.1, Author              
Renz, W.2, Author
Wilhelm, R.4, Author              
Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288              
2External Organizations, ou_persistent22              
3Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856284              
4Technology (TE), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856318              

Content

show

Details

show
hide
Language(s):
 Dates: 1989
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: -
 Degree: -

Event

show
hide
Title: ISPC-9
Place of Event: Pugnochiuso (IT)
Start-/End Date: 1989-09-04 - 1989-09-08

Legal Case

show

Project information

show

Source 1

show
hide
Title: 9.International Symposium on Plasma Chemistry
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: -
Pages: - Volume / Issue: Vol. 3 Sequence Number: - Start / End Page: 1826 - 1831 Identifier: -