Plasma Deposition of Thin Hydrogenated Carbon Films in an Experimental ECR 
Device

Jacob, W.; D'Agostino, R.; Boutard, D.; Dose, V.; Koch, A.; Moeller, W.; Renz, W.; Wilhelm, R.

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Plasma Deposition of Thin Hydrogenated Carbon Films in an Experimental ECR Device

Jacob, W., D'Agostino, R., Boutard, D., Dose, V., Koch, A., Moeller, W., et al. (1989). Plasma Deposition of Thin Hydrogenated Carbon Films in an Experimental ECR Device. 9.International Symposium on Plasma Chemistry, Vol. 3, 1826-1831.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-C355-1 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-C356-0

Genre: Conference Paper

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Creators:
Jacob, W.¹, Author
D'Agostino, R.², Author
Boutard, D.², Author
Dose, V.^{1, 3}, Author
Koch, A.², Author
Moeller, W.¹, Author
Renz, W.², Author
Wilhelm, R.⁴, Author

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
2External Organizations, ou_persistent22
3Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856284
4Technology (TE), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856318

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Dates: Date issued: 1989

Publication Status: Issued

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Title: ISPC-9

Place of Event: Pugnochiuso (IT)

Start-/End Date: 1989-09-04 - 1989-09-08

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Title: 9.International Symposium on Plasma Chemistry

Source Genre: Journal

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Pages: - Volume / Issue: Vol. 3 Sequence Number: - Start / End Page: 1826 - 1831 Identifier: -