High-Performance Small-Track-Width Metal-in-Gap Heads Made by Reactive Ion 
Etching

Sillen, C.W.P.M.; Ruigrok, J.J.M.; Veprek-Heijman, M.G.J.; Bode-Fassbender, A.J.G.; Giesbers, J.B.

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High-Performance Small-Track-Width Metal-in-Gap Heads Made by Reactive Ion Etching

Sillen, C., Ruigrok, J., Veprek-Heijman, M., Bode-Fassbender, A., & Giesbers, J. (1990). High-Performance Small-Track-Width Metal-in-Gap Heads Made by Reactive Ion Etching. J. of Magnetism and Magn. Materials, 83, 45-47.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-C526-C Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-C527-A

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Sillen, C.W.P.M.¹, Author
Ruigrok, J.J.M.¹, Author
Veprek-Heijman, M.G.J.¹, Author
Bode-Fassbender, A.J.G.¹, Author
Giesbers, J.B.¹, Author

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1External Organizations, ou_persistent22

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Dates: Date issued: 1990

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Title: J. of Magnetism and Magn. Materials

Source Genre: Journal

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Pages: - Volume / Issue: 83 Sequence Number: - Start / End Page: 45 - 47 Identifier: -