Computer Simulation of Boron Nitride Deposition by Ion-Beam-Assisted Evaporation

Moeller, W.; Bouchier, D.; Burat, O.; Stambouli, V.

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Computer Simulation of Boron Nitride Deposition by Ion-Beam-Assisted Evaporation

Moeller, W., Bouchier, D., Burat, O., & Stambouli, V. (1991). Computer Simulation of Boron Nitride Deposition by Ion-Beam-Assisted Evaporation. Surface and Coatings Technology, 45, 73-81.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-C93A-9 Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-C93B-7

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Urheber:
Moeller, W.¹, Autor
Bouchier, D.², Autor
Burat, O.², Autor
Stambouli, V.², Autor

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
2External Organizations, ou_persistent22