Scalable Microwave ECR Plasma Source for Industrial PVD-Applications

Geisler, M.; Harry, John E.; Jung, M.; Koetter-Faulhaber, R.; Leuterer, F.; Muenich, M.; Wilhelm, R.; et al.,; International Union of Pure and Applied Chemistry, London(GB)

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Scalable Microwave ECR Plasma Source for Industrial PVD-Applications

Geisler, M., Harry, J. E., Jung, M., Koetter-Faulhaber, R., Leuterer, F., Muenich, M., et al. (1993). Scalable Microwave ECR Plasma Source for Industrial PVD-Applications. In J. E. Harry (Ed.), Proceedings of the 11th International Symposium on Plasma Chemistry (ISPC 11) (pp. 1143-1147).

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-CD7F-F Version Permalink: https://hdl.handle.net/21.11116/0000-0000-E75E-3

Genre: Conference Paper

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Creators:
Geisler, M.¹, Author
Harry, John E.¹, Author
Jung, M.², Author
Koetter-Faulhaber, R.¹, Author
Leuterer, F.³, Author
Muenich, M.³, Author
Wilhelm, R.³, Author
et al.¹, Author
International Union of Pure and Applied Chemistry, London(GB), Editor

Affiliations:
1External Organizations, ou_persistent22
2Experimental Plasma Physics 1 (E1), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856295
3Technology (TE), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856318

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Dates: Date issued: 1993

Publication Status: Issued

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Title: 11th International Symposium on Plasma Chemistry (ISPC 11)

Place of Event: Loughborough (GB)

Start-/End Date: 1993-08-22 - 1993-08-27

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Title: Proceedings of the 11th International Symposium on Plasma Chemistry (ISPC 11)

Source Genre: Proceedings

Creator(s):
Harry, J. E., Editor

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-

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Pages: - Volume / Issue: - Sequence Number: - Start / End Page: 1143 - 1147 Identifier: -