Stability of Plasma Deposited Amorphous Hydrogenated Boron Films

Annen, A.; Sass, M.; Beckmann, R.; Jacob, W.

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Stability of Plasma Deposited Amorphous Hydrogenated Boron Films

Annen, A., Sass, M., Beckmann, R., & Jacob, W. (1997). Stability of Plasma Deposited Amorphous Hydrogenated Boron Films. Thin Solid Films, 300, 101-106.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-CF03-6 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-CF04-4

Genre: Journal Article

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Creators:
Annen, A.¹, Author
Sass, M.², Author
Beckmann, R.³, Author
Jacob, W.¹, Author

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
2Max Planck Institute for Plasma Physics, ou_persistent27
3External Organizations, ou_persistent22

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Dates: Date issued: 1997

Publication Status: Issued

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Title: Thin Solid Films

Source Genre: Journal

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Pages: - Volume / Issue: 300 Sequence Number: - Start / End Page: 101 - 106 Identifier: -