Evaluation of an Advanced Silicon Doped CFC for Plasma Facing Material

Wu, C.H.; Varandas, C.; Alessandrini, C.; Serra, F.; Bonal, P.; Grote, H.; Balden, M.; Vieider, G.; et al.,

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Evaluation of an Advanced Silicon Doped CFC for Plasma Facing Material

Wu, C., Varandas, C., Alessandrini, C., Serra, F., Bonal, P., Grote, H., et al. (1997). Evaluation of an Advanced Silicon Doped CFC for Plasma Facing Material. Fusion Technology, Vol. 1, 327-330.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-D099-2 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-D09A-F

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Creators:
Wu, C.H.¹, Author
Varandas, C.¹, Author
Alessandrini, C.¹, Author
Serra, F.¹, Author
Bonal, P.¹, Author
Grote, H.^{2, 3, 4}, Author
Balden, M.⁵, Author
Vieider, G.¹, Author
et al.¹, Author

Affiliations:
1External Organizations, ou_persistent22
2Experimental Plasma Physics 2 (E2), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856292
3W7-X: Construction, Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856314
4Plasma Diagnostics Group (HUB), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856324
5Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288

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Dates: Date issued: 1997

Publication Status: Issued

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Title: 19. SOFT

Place of Event: Amsterdam Lisbon (PT)

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Title: Fusion Technology

Source Genre: Journal

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Publ. Info: Elsevier

Pages: - Volume / Issue: Vol. 1 Sequence Number: - Start / End Page: 327 - 330 Identifier: -