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  Study on the Atomic and Electronic Structure in CrN (VN, TiN) Films using Cs-Corrected TEM

Zhang, Z., & Dehm, G. (2015). Study on the Atomic and Electronic Structure in CrN (VN, TiN) Films using Cs-Corrected TEM. Microscopy and Microanalysis, 21(3), 2079-2080. doi:10.1017/S1431927615011174.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-0028-E693-A Version Permalink: http://hdl.handle.net/11858/00-001M-0000-0028-E695-6
Genre: Journal Article

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 Creators:
Zhang, Zaoli1, Author              
Dehm, Gerhard2, Author              
Affiliations:
1Erich Schmid Institute of Material Science, Austrian Academy of Sciences, Leoben, Austria, ou_persistent22              
2Structure and Nano-/ Micromechanics of Materials, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863398              

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Language(s): eng - English
 Dates: 2015-092015
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Method: -
 Identifiers: DOI: 10.1017/S1431927615011174
 Degree: -

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Title: Microscopy and Microanalysis
  Abbreviation : Microsc. Microanal.
Source Genre: Journal
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Affiliations:
Publ. Info: -
Pages: - Volume / Issue: 21 (3) Sequence Number: - Start / End Page: 2079 - 2080 Identifier: ISSN: 1431-9276
CoNE: https://pure.mpg.de/cone/journals/resource/991042731793414