Study on the Atomic and Electronic Structure in CrN (VN, TiN) Films using Cs
-Corrected TEM

Zhang, Zaoli; Dehm, Gerhard

doi:10.1017/S1431927615011174

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Study on the Atomic and Electronic Structure in CrN (VN, TiN) Films using C_s-Corrected TEM

Zhang, Z., & Dehm, G. (2015). Study on the Atomic and Electronic Structure in CrN (VN, TiN) Films using C_s-Corrected TEM. Microscopy and Microanalysis, 21(3), 2079-2080. doi:10.1017/S1431927615011174.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-E693-A Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-E695-6

Genre: Journal Article

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Creators:
Zhang, Zaoli¹, Author
Dehm, Gerhard², Author

Affiliations:
1Erich Schmid Institute of Material Science, Austrian Academy of Sciences, Leoben, Austria, ou_persistent22
2Structure and Nano-/ Micromechanics of Materials, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863398

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Language(s): eng - English

Dates: Published Online: 2015-09Date issued: 2015

Publication Status: Issued

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Identifiers: DOI: 10.1017/S1431927615011174

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Title: Microscopy and Microanalysis

Abbreviation : Microsc. Microanal.

Source Genre: Journal

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Pages: - Volume / Issue: 21 (3) Sequence Number: - Start / End Page: 2079 - 2080 Identifier: ISSN: 1431-9276
CoNE: https://pure.mpg.de/cone/journals/resource/991042731793414