Comparative study of ALD SiO2 thin films for optical applications

Pfeiffer, K.; Shestaeva, S.; Bingel, A.; Munzert, P.; Ghazaryan, L.; van Helvoirt, C.; Kessels, W. M. M.; Sanli, U. T.; Grévent, C.; Schütz, G.; Putkonen, M.; Buchanan, I.; Jensen, L.; Ristau, D.; Tünnermann, A.; Szeghalmi, A.

doi:10.1364/OME.6.000660

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Comparative study of ALD SiO₂ thin films for optical applications

Pfeiffer, K., Shestaeva, S., Bingel, A., Munzert, P., Ghazaryan, L., van Helvoirt, C., et al. (2016). Comparative study of ALD SiO₂ thin films for optical applications. Optical materials express, 6(2), 660-670. doi:10.1364/OME.6.000660.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0029-B039-7 Version Permalink: https://hdl.handle.net/21.11116/0000-0001-E12E-E

Genre: Journal Article

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Creators:
Pfeiffer, K.¹, Author
Shestaeva, S.², Author
Bingel, A.^{1, 2}, Author
Munzert, P.², Author
Ghazaryan, L.¹, Author
van Helvoirt, C.³, Author
Kessels, W. M. M.³, Author
Sanli, U. T.⁴, Author
Grévent, C.⁴, Author
Schütz, G.⁴, Author
Putkonen, M.⁵, Author
Buchanan, I.⁶, Author
Jensen, L.⁷, Author
Ristau, D.⁷, Author
Tünnermann, A.^{1, 2}, Author
Szeghalmi, A.^{1, 2}, Author

Affiliations:
1Institute of Applied Physics, Abbe Center of Phontonics, Friedrich Schiller University Jena, Albert-Einstein-Str. 13, 07745 Jena, Germany, ou_persistent22
2Fraunhofer Institute for Applied Optics and Prescision Engineering IOF, Albert-Einstein-Str. 7, 07745 Jena, Germany, ou_persistent22
3Department of Applied Physics, Eindhoven University of Technology, Eindhoven, The Netherlands, ou_persistent22
4Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497648
5VTT Technical Research Centre Finland, P.O. Box 1000, 02044 VTT, Espoo, Finland, ou_persistent22
6Air Products & Chemicals Inc., 7201 Hamilton Blvd., Allentown, PA 18195, USA, ou_persistent22
7Laser Zentrum Hannover e.V., Hollerithallee 8, 30419 Hannover, Germany, ou_persistent22

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Free keywords: Abt. Schütz

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Language(s): eng - English

Dates: Published Online: 2016-01-27

Publication Status: Published online

Pages: 11

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Table of Contents: -

Rev. Type: Peer

Identifiers: DOI: 10.1364/OME.6.000660

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Title: Optical materials express

Source Genre: Journal

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Publ. Info: Washington, DC : OSA

Pages: - Volume / Issue: 6 (2) Sequence Number: - Start / End Page: 660 - 670 Identifier: Other: 2159-3930
CoNE: https://pure.mpg.de/cone/journals/resource/21593930