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  Soft lithography: Harnessing the unstable

Herminghaus, S. (2003). Soft lithography: Harnessing the unstable. Nature Materials, 2(1), 11-12. doi:10.1038/nmat7999.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-0029-A9E8-3 Version Permalink: http://hdl.handle.net/11858/00-001M-0000-0029-A9E9-1
Genre: Journal Article

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 Creators:
Herminghaus, Stephan1, Author              
Affiliations:
1Group Granular matter and irreversibility, Department of Dynamics of Complex Fluids, Max Planck Institute for Dynamics and Self-Organization, Max Planck Society, ou_2063306              

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 Abstract: A contact-free method for generating precise patterns in polymers is an exciting advance in soft lithography. By exploiting the interactions of two polymers with an electric field, the scale of the patterns can be reduced still further.

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Language(s): eng - English
 Dates: 2003
 Publication Status: Published in print
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 Rev. Method: -
 Identifiers: BibTex Citekey: herminghaus_soft_2003
DOI: 10.1038/nmat7999
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Title: Nature Materials
Source Genre: Journal
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Publ. Info: London, UK : Nature Pub. Group
Pages: - Volume / Issue: 2 (1) Sequence Number: - Start / End Page: 11 - 12 Identifier: ISSN: 1476-1122
CoNE: /journals/resource/111054835734000