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  Ab Initio Solution of Structural Dynamics with Ultrafast Electron Diffraction and Charge Flipping

Liu, L. C., Jiang, Y., Lu, C., Gao, M., Ishikawa, M., Yamochi, H., et al. (2015). Ab Initio Solution of Structural Dynamics with Ultrafast Electron Diffraction and Charge Flipping. Springer Proceedings in Physics, 162, 287-290.

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http://dx.doi.org/10.1007/978-3-319-13242-6_70 (Publisher version)
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 Creators:
Liu, Lai Chung1, 2, Author           
Jiang, Yifeng1, Author           
Lu, Cheng2, Author
Gao, Meng1, 2, Author           
Ishikawa, Manabu3, Author
Yamochi, Hideki3, Author
Miller, R. J. D.1, 2, Author           
Affiliations:
1Miller Group, Atomically Resolved Dynamics Department, Max Planck Institute for the Structure and Dynamics of Matter, Max Planck Society, ou_1938288              
2Departments of Chemistry and Physics, University of Toronto, ou_persistent22              
3Research Center for Low Temperature and Materials Sciences, Kyoto University, ou_persistent22              

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Free keywords: OCIS codes: (320.2250) Femtosecond phenomena, (320.7130) Ultrafast processes in condensed matter, including semiconductors
 Abstract: Ultrafast electron diffraction is used to probe the photoinduced structural dynamics of single crystal (EDO-TTF)2PF6 with femtosecond time resolution. Structure factor phases at key time points are solved ab initio using the charge-flipping method.

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Language(s): eng - English
 Dates: 2015-01-25
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Internal
 Identifiers: DOI: 10.1007/978-3-319-13242-6_70
 Degree: -

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Title: 19th International Conference on Ultrafast Phenomena
Place of Event: Okinawa Convention Center, Okinawa, Japan
Start-/End Date: 2014-07-07 - 2014-07-11

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Title: Springer Proceedings in Physics
  Other : Ultrafast Phenomena XIX
Source Genre: Journal
 Creator(s):
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Publ. Info: Berlin : Springer-Verlag
Pages: - Volume / Issue: 162 Sequence Number: - Start / End Page: 287 - 290 Identifier: ISSN: 0930-8989
CoNE: https://pure.mpg.de/cone/journals/resource/110978978742279
ISBN: 978-3-319-13241-9
ISBN: 978-3-319-13242-6