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  Advanced Colloidal Lithography Beyond Surface Patterning

Ai, B., Möhwald, H., Wang, D., & Zhang, G. (2017). Advanced Colloidal Lithography Beyond Surface Patterning. Advanced Materials Interfaces, 4(1): 201600271. doi:10.1002/admi.201600271.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-002A-F500-5 Version Permalink: http://hdl.handle.net/21.11116/0000-0000-3DD8-9
Genre: Journal Article

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2308302.pdf (Publisher version), 6MB
 
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 Creators:
Ai, Bin, Author
Möhwald, Helmuth1, Author              
Wang, Dayang, Author
Zhang, Gang, Author
Affiliations:
1Grenzflächen, Max Planck Institute of Colloids and Interfaces, Max Planck Society, ou_1863287              

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Free keywords: colloidal lithography, nanostructures, surface plasmon resonance
 Abstract: This progress report presents an overview of recent development of colloidal lithography (CL) and its applications in fabrication of various nanostructures consisted of orderly arranged, dots, holes, bowls, cones, pillars, rings, shells and triangles. These structures have been widely exploited in various fields, including plasmonics, optics, wettability, sensors, solar cells, organic light-emitting diode (OLEDs), biology and many others. The recent successes in the technical applications of the nanostructures fabricated via CL will be summarized. Hopefully, the present review will inspire more ingenious designs and execution of CL for advanced, smart applications.

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 Dates: 2016-06-222017-01-09
 Publication Status: Published in print
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 Identifiers: DOI: 10.1002/admi.201600271
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Title: Advanced Materials Interfaces
Source Genre: Journal
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Publ. Info: Weinheim : Wiley-VCH
Pages: - Volume / Issue: 4 (1) Sequence Number: 201600271 Start / End Page: - Identifier: ISSN: 2196-7350