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  Material Properties of Laser-Welded Thin Silicon Foils

Hessmann, M. T., Kunz, T., Voigt, M., Cvecek, K., Schmidt, M., Bochmann, A., et al. (2013). Material Properties of Laser-Welded Thin Silicon Foils. INTERNATIONAL JOURNAL OF PHOTOENERGY, 724502. doi:10.1155/2013/724502.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-002D-67DD-C Versions-Permalink: https://hdl.handle.net/21.11116/0000-0006-41CB-C
Genre: Zeitschriftenartikel

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 Urheber:
Hessmann, M. T.1, Autor
Kunz, T.1, Autor
Voigt, M.1, Autor
Cvecek, K.1, Autor
Schmidt, M.1, Autor
Bochmann, A.1, Autor
Christiansen, S.2, 3, Autor           
Auer, R.1, Autor
Brabec, C. J.1, Autor
Affiliations:
1external, ou_persistent22              
2Christiansen Research Group, Research Groups, Max Planck Institute for the Science of Light, Max Planck Society, ou_2364716              
3Micro- & Nanostructuring, Technology Development and Service Units, Max Planck Institute for the Science of Light, Max Planck Society, ou_2364725              

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Schlagwörter: Chemistry; Energy & Fuels; Optics; Physics;
 Zusammenfassung: An extended monocrystalline silicon base foil offers a great opportunity to combine low-cost production with high efficiency silicon solar cells on a large scale. By overcoming the area restriction of ingot-based monocrystalline silicon wafer production, costs could be decreased to thin film solar cell range. The extended monocrystalline silicon base foil consists of several individual thin silicon wafers which are welded together. A comparison of three different approaches to weld 50 mu m thin silicon foils is investigated here: (1) laser spot welding with low constant feed speed, (2) laser line welding, and (3) keyhole welding. Cross-sections are prepared and analyzed by electron backscatter diffraction (EBSD) to reveal changes in the crystal structure at the welding side after laser irradiation. The treatment leads to the appearance of new grains and boundaries. The induced internal stress, using the three different laser welding processes, was investigated by micro-Raman analysis. We conclude that the keyhole welding process is the most favorable to produce thin silicon foils.

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Sprache(n): eng - English
 Datum: 2013
 Publikationsstatus: Online veröffentlicht
 Seiten: 6
 Ort, Verlag, Ausgabe: -
 Inhaltsverzeichnis: -
 Art der Begutachtung: -
 Identifikatoren: ISI: 000322975500001
DOI: 10.1155/2013/724502
 Art des Abschluß: -

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Titel: INTERNATIONAL JOURNAL OF PHOTOENERGY
Genre der Quelle: Zeitschrift
 Urheber:
Affiliations:
Ort, Verlag, Ausgabe: 410 PARK AVENUE, 15TH FLOOR, #287 PMB, NEW YORK, NY 10022 USA : HINDAWI PUBLISHING CORPORATION
Seiten: - Band / Heft: - Artikelnummer: 724502 Start- / Endseite: - Identifikator: ISSN: 1110-662X