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  Photoluminescence of samples produced by electroless wet chemical etching: Between silicon nanowires and porous structures

Voigt, F., Sivakov, V., Gerliz, V., Bauer, G. H., Hoffmann, B., Radnoczi, G. Z., Pecz, B., & Christiansen, S. (2011). Photoluminescence of samples produced by electroless wet chemical etching: Between silicon nanowires and porous structures. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 208(4), 893-899. doi:10.1002/pssa.201026520.

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資料種別: 学術論文

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 作成者:
Voigt, Felix1, 著者
Sivakov, Vladimir1, 著者
Gerliz, Viktor1, 著者
Bauer, Gottfried H.1, 著者
Hoffmann, Bjoern2, 著者           
Radnoczi, Gyorgy Z.1, 著者
Pecz, Bela1, 著者
Christiansen, Silke2, 3, 著者           
所属:
1external, ou_persistent22              
2Micro- & Nanostructuring, Technology Development and Service Units, Max Planck Institute for the Science of Light, Max Planck Society, ou_2364725              
3Christiansen Research Group, Research Groups, Max Planck Institute for the Science of Light, Max Planck Society, ou_2364716              

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キーワード: LUMINESCENCE; OXYGEN; NANOCRYSTALS; SILOXENE; ARRAYSMaterials Science; Physics; nanowires; photoluminescence; porous silicon; silica; silicon;
 要旨: Samples containing silicon nanowires (Si-NWs) and highly porous structures (P-Si) were prepared by electroless wet chemical etching (EWCE) of crystalline silicon wafers using various etching parameters. Photoluminescence (PL) measurements were performed with excitation at 488 nm and a photon energy flux of 337mWcm (2). According to the diameters of the Si-NWs (> 10 nm), from quantum confinement (QC) theory no shift in PL peak energy compared to the bandgap of crystalline silicon is expected. However, PL measurements show peak emission energies ranging between 1.4 and 1.6 eV. After further treatment of the samples with HF, substantial PL emission was still detectable with the measured PL peak pinned at 1.4 eV irrespective of etching time. We explain the observations by the hypothesis that the persistent part of PL emission is generated by nanocrystals located at the rough sidewalls of the Si-NWs or residing within the porous sample structure. The part of the PL, which was present before HF treatment, but vanished after the treatment, is attributed to the presence of silicon suboxide surrounding the Si-NWs or covering other Si surfaces. This hypothesis is explored by means of three sample series, prepared with different preparation parameters. In the first series the time used during the initial metallization step in order to prepare an Ag nanoparticle layer on the top surface was varied, in the second series the etching time was the changed parameter and in the third series the HF to H(2)O(2) concentration ratio was varied. [GRAPHICS] Strong visible orange colored PL of a sample produced by EWCE starting from a heavily doped wafer (n-type c-Si (111), As as dopant) and excited at 337 nm ( the sample was mounted on a glass substrate. Blue luminescence is due to the substrate). (C) 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

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言語: eng - English
 日付: 2011
 出版の状態: 出版
 ページ: 7
 出版情報: -
 目次: -
 査読: -
 識別子(DOI, ISBNなど): ISI: 000289513700025
DOI: 10.1002/pssa.201026520
 学位: -

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出版物名: PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE
種別: 学術雑誌
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出版社, 出版地: COMMERCE PLACE, 350 MAIN ST, MALDEN 02148, MA USA : WILEY-BLACKWELL
ページ: - 巻号: 208 (4) 通巻号: - 開始・終了ページ: 893 - 899 識別子(ISBN, ISSN, DOIなど): ISSN: 1862-6300