ausblenden:
Schlagwörter:
ELECTRON-BEAM LITHOGRAPHY; ROUGH STRIPS; SILICON; DESIGN; FILTERS;
SENSOROptics;
Zusammenfassung:
In this work we investigate, analytically and numerically, the effect on the diffracted field produced by typical fabrication errors in sawtooth gratings. The analysis is carried out for the near and far field, showing the effects on the intensity and on the diffraction orders efficiency. When the grating profile is not perfect but presents a curved profile or overdevelopment error, some different diffraction orders appear, changing the intensity and the efficiency of each order. In addition, when roughness is present, a decreasing of efficiency is produced, but without generating different diffraction orders than the first one. We show the analytical dependence of these modifications in terms of the profile of the grating, corroborating the results with numerical methods. (C) 2010 Optical Society of America
