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  Tunable UV laser photolysis of organometallics with product detection by laser mass spectroscopy: Trimethylaluminum.

Beuermann, T., & Stuke, M. (1989). Tunable UV laser photolysis of organometallics with product detection by laser mass spectroscopy: Trimethylaluminum. Applied Physics B, 49(2), 145-148. doi:10.1007/BF00332274.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-002C-39B6-5 Version Permalink: http://hdl.handle.net/11858/00-001M-0000-002C-39B9-0
Genre: Journal Article

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 Creators:
Beuermann, T.1, Author              
Stuke, M.2, Author              
Affiliations:
1Abteilung Laserphysik, MPI for biophysical chemistry, Max Planck Society, ou_578547              
2Research Group of Laser Chemical Processing, MPI for biophysical chemistry, Max Planck Society, ou_578609              

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 Abstract: We use tunable UV laser light in the region 200–320 nm, produced by frequency doubling the output of a dye laser, for the decomposition of organometallic compounds. This method has been applied to TMA, trimethylaluminum Al(CH3)3. Only the TMA monomer absorbs UV light for λ >220 nm. TMA decomposes by one-photon absorption mainly into two channels: aluminum atoms Al plus organic fragments, and aluminummonomethyl AlCH3 molecules plus organic fragments. The ratio [Al]/[AlCH3] is wavelength dependent. We present a mechanism to explain the photolysis of trimethyl compounds of group III elements (Al, Ga, In).

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Language(s): eng - English
 Dates: 1989-08
 Publication Status: Published in print
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 Rev. Method: Peer
 Identifiers: DOI: 10.1007/BF00332274
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Title: Applied Physics B
Source Genre: Journal
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Pages: - Volume / Issue: 49 (2) Sequence Number: - Start / End Page: 145 - 148 Identifier: -