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  Ablation of polytetrafluoroethylene (Teflon) with femtosecond UV excimer laser pulses.

Küper, S., & Stuke, M. (1989). Ablation of polytetrafluoroethylene (Teflon) with femtosecond UV excimer laser pulses. Applied Physics Letters, 54(1), 4-6. doi:10.1063/1.100831.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-002C-6404-F Version Permalink: http://hdl.handle.net/11858/00-001M-0000-002C-6407-9
Genre: Journal Article

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 Creators:
Küper, S.1, Author              
Stuke, M.1, Author              
Affiliations:
1Abteilung Laserphysik, MPI for biophysical chemistry, Max Planck Society, ou_578547              

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 Abstract: Experiments on the ablation of undoped polytetrafluoroethylene (Teflon) with 300 fs UV excimer laser pulses at 248 nm are reported for the first time. In contrast to standard excimer laser pulses, these ultrashort pulses ablate Teflon with good edge quality and no signs of thermal damage for fluences down to 0.5 J/cm2 with removal rates on the order of 1 μm per pulse.

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Language(s): eng - English
 Dates: 1989-01
 Publication Status: Published in print
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 Rev. Method: Peer
 Identifiers: DOI: 10.1063/1.100831
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Title: Applied Physics Letters
Source Genre: Journal
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Pages: - Volume / Issue: 54 (1) Sequence Number: - Start / End Page: 4 - 6 Identifier: -