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  UV laser photofragment GaCH3 detected by far UV laser mass spectrometry.

Zhang, Y., Beuermann, T., & Stuke, M. (1989). UV laser photofragment GaCH3 detected by far UV laser mass spectrometry. Applied Physics B, 48, 97-100. doi:10.1007/BF00694425.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-002C-84B9-4 Version Permalink: http://hdl.handle.net/11858/00-001M-0000-002C-84BD-B
Genre: Journal Article

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 Creators:
Zhang, Y.1, Author              
Beuermann, T.1, Author              
Stuke, M.1, Author              
Affiliations:
1Abteilung Laserphysik, MPI for biophysical chemistry, Max Planck Society, ou_578547              

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 Abstract: The GaCH3 radical has been directly detected by far UV laser mass spectrometry for the first time, as a UV laser photofragment from gaseous trimethylgallium Ga(CH3)3, but not from triethylgallium, Ga(C2H5)3. The relative yield Y(λ) of GaCH3 was measured, at various UV photolysis laser wavelengths λ=193, 210 and 245 nm, and follows the absorption spectrum of the Ga(CH3)3 precursor molecules.

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Language(s): eng - English
 Dates: 1989-01
 Publication Status: Published in print
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 Rev. Method: Peer
 Identifiers: DOI: 10.1007/BF00694425
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Title: Applied Physics B
Source Genre: Journal
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Pages: - Volume / Issue: 48 Sequence Number: - Start / End Page: 97 - 100 Identifier: -