Quantitative reconstruction of Ta/Si multilayer depth profiles obtained by 
Time-of-Flight-Secondary-Ion-Mass-Spectrometry (ToF-SIMS) using Cs+ ion 
sputtering

Liu, Y.; Hofmann, Siegfried; Wang, J. Y.; Chakraborty, B. R.

doi:10.1016/j.tsf.2015.07.081

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Quantitative reconstruction of Ta/Si multilayer depth profiles obtained by Time-of-Flight-Secondary-Ion-Mass-Spectrometry (ToF-SIMS) using Cs+ ion sputtering

Liu, Y., Hofmann, S., Wang, J. Y., & Chakraborty, B. R. (2015). Quantitative reconstruction of Ta/Si multilayer depth profiles obtained by Time-of-Flight-Secondary-Ion-Mass-Spectrometry (ToF-SIMS) using Cs+ ion sputtering. Thin Solid Films, 591, 60-65. doi:10.1016/j.tsf.2015.07.081.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-002C-E44A-A Version Permalink: https://hdl.handle.net/11858/00-001M-0000-002C-E44B-8

Genre: Journal Article

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Creators:
Liu, Y.¹, Author
Hofmann, Siegfried², Author
Wang, J. Y.¹, Author
Chakraborty, B. R.³, Author

Affiliations:
1Department of Physics, Shantou University, 243 Daxue Road, Shantou, 515063 Guangdong, China, ou_persistent22
2Emeriti and Others, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497650
3Sophisticated Instrumentation Division, CSIR-National Physical Laboratory, Dr.K.S. Krishnan Road, New Delhi 110012, India, ou_persistent22

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Free keywords: Emeriti and Others

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Language(s): eng - English

Dates: Date issued: 2015-09-30

Publication Status: Issued

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Identifiers: DOI: 10.1016/j.tsf.2015.07.081

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Title: Thin Solid Films

Abbreviation : Thin Solid Films

Source Genre: Journal

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Publ. Info: Lausanne, Switzerland, etc. : Elsevier

Pages: - Volume / Issue: 591 Sequence Number: - Start / End Page: 60 - 65 Identifier: ISSN: 0040-6090
CoNE: https://pure.mpg.de/cone/journals/resource/954925449792