Robust Two-Dimensional Electronic Properties in Three-Dimensional 
Microstructures of Rotationally Stacked Turbostratic Graphene

Richter, N.; Hernandez, Yenny R.; Schweitzer, S.; Kim, J. S.; Patra, A. K.; Englert, J.; Lieberwirth, Ingo; Liscio, A.; Palermo, V.; Feng, Xinliang; Hirsch, A.; Müllen, K.; Kläui, M.

doi:10.1103/PhysRevApplied.7.024022

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Robust Two-Dimensional Electronic Properties in Three-Dimensional Microstructures of Rotationally Stacked Turbostratic Graphene

Richter, N., Hernandez, Y. R., Schweitzer, S., Kim, J. S., Patra, A. K., Englert, J., et al. (2017). Robust Two-Dimensional Electronic Properties in Three-Dimensional Microstructures of Rotationally Stacked Turbostratic Graphene. Physical Review Applied, 7(2): 024022. doi:10.1103/PhysRevApplied.7.024022.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-002D-0ABC-2 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-002D-0ABD-F

Genre: Journal Article

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Creators:
Richter, N., Author
Hernandez, Yenny R.¹, Author
Schweitzer, S., Author
Kim, J. S., Author
Patra, A. K., Author
Englert, J., Author
Lieberwirth, Ingo², Author
Liscio, A., Author
Palermo, V., Author
Feng, Xinliang³, Author
Hirsch, A., Author
Müllen, K.¹, Author
Kläui, M., Author

Affiliations:
1Dept. Müllen: Synthetic Chemistry, MPI for Polymer Research, Max Planck Society, ou_1800289
2Dept. Landfester: Physical Chemistry of Polymers, MPI for Polymer Research, Max Planck Society, ou_1800288
3Tech Univ Dresden, D-01069 Dresden, Germany, ou_persistent22

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Language(s): eng - English

Dates: Date issued: 2017

Publication Status: Issued

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Identifiers: DOI: 10.1103/PhysRevApplied.7.024022

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Title: Physical Review Applied

Abbreviation : Phys. Rev. Appl.

Source Genre: Journal

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Publ. Info: College Park, Md. [u.a.] : American Physical Society

Pages: - Volume / Issue: 7 (2) Sequence Number: 024022 Start / End Page: - Identifier: ISSN: 2331-7019
CoNE: https://pure.mpg.de/cone/journals/resource/2331-7019