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  Ultrafast Self-Assembly of Sub-10 nm Block Copolymer Nanostructures by Solvent-Free High-Temperature Laser Annealing

Jiang, J., Jacobs, A. G., Wenning, B., Liedel, C., Thompson, M. O., & Ober, C. K. (2017). Ultrafast Self-Assembly of Sub-10 nm Block Copolymer Nanostructures by Solvent-Free High-Temperature Laser Annealing. ACS Applied Materials and Interfaces, 9(37), 31317-31324. doi:10.1021/acsami.7b00774.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-002D-71D9-5 Version Permalink: http://hdl.handle.net/11858/00-001M-0000-002E-016D-7
Genre: Journal Article
Alternative Title : ACS Applied Materials & Interfaces

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 Creators:
Jiang, Jing, Author
Jacobs, Alan G., Author
Wenning, Brandon, Author
Liedel, Clemens1, Author              
Thompson, Michael O., Author
Ober, Christopher K., Author
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1External Organizations, ou_persistent22              

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 Dates: 2017-062017-09-20
 Publication Status: Published in print
 Pages: -
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 Table of Contents: -
 Rev. Method: -
 Identifiers: DOI: 10.1021/acsami.7b00774
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Title: ACS Applied Materials and Interfaces
  Abbreviation : ACS Appl. Mater. Interfaces
Source Genre: Journal
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Publ. Info: Washington, DC : American Chemical Society
Pages: - Volume / Issue: 9 (37) Sequence Number: - Start / End Page: 31317 - 31324 Identifier: ISSN: 1944-8244