Development of a method to prepare thin metal films samples with controlled 
small/large aspect ratio roughness

Pedroni, M.; Vassallo, E.; Ghezzi, F.; Caniello, R.; Schwarz-Selinger, T.

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Development of a method to prepare thin metal films samples with controlled small/large aspect ratio roughness

Pedroni, M., Vassallo, E., Ghezzi, F., Caniello, R., & Schwarz-Selinger, T. (2017). Development of a method to prepare thin metal films samples with controlled small/large aspect ratio roughness. Poster presented at 16th International Conference on Plasma-Facing Materials and Components for Fusion Applications (PFMC-16), Neuss.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-002D-7E9A-D Version Permalink: https://hdl.handle.net/21.11116/0000-0001-5035-9

Genre: Poster

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Creators:
Pedroni, M.¹, Author
Vassallo, E.¹, Author
Ghezzi, F.¹, Author
Caniello, R.¹, Author
Schwarz-Selinger, T.², Author

Affiliations:
1External Organizations, ou_persistent22
2Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856327

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Language(s): eng - English

Dates: Created: 2017

Publication Status: Not specified

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Title: 16th International Conference on Plasma-Facing Materials and Components for Fusion Applications (PFMC-16)

Place of Event: Neuss

Start-/End Date: 2017-05-16 - 2017-05-19

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