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  Dual absorber Fe2O3/WO3 host-guest architectures for improved charge generation and transfer in photoelectrochemical applications

Müller, A., Kondofersky, I., Folger, A., Fattakhova-Rohlfing, D., Bein, T., & Scheu, C. (2017). Dual absorber Fe2O3/WO3 host-guest architectures for improved charge generation and transfer in photoelectrochemical applications. Materials Research Express, 4(1): 016409, pp. 1-9. doi:10.1088/2053-1591/aa570f.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-002D-A139-5 Version Permalink: https://hdl.handle.net/21.11116/0000-0005-9312-0
Genre: Journal Article

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Müller_2017_Mater._Res._Express_4_016409.pdf (Publisher version), 3MB
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 Creators:
Müller, Alexander1, 2, 3, Author           
Kondofersky, Ilina2, Author           
Folger, Alena1, Author           
Fattakhova-Rohlfing, Dina2, Author           
Bein, Thomas2, Author           
Scheu, Christina1, Author           
Affiliations:
1Nanoanalytics and Interfaces, Independent Max Planck Research Groups, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_2054294              
2Department of Chemistry and Center for NanoScience (CeNS), Ludwig-Maximilians- Universität München, Butenandtstr. 5-11, D-81377 Munich, Germany, ou_persistent22              
3National Center for Electron Microscopy, Molecular Foundry, Lawrence Berkeley National Laboratory, 1 Cyclotron Rd, Berkeley, CA 94720, United States of America, ou_persistent22              

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Language(s): eng - English
 Dates: 2017-01-30
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1088/2053-1591/aa570f
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Title: Materials Research Express
Source Genre: Journal
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Publ. Info: Bristol : IoPP
Pages: 9 Volume / Issue: 4 (1) Sequence Number: 016409 Start / End Page: 1 - 9 Identifier: Other: 2053-1591
CoNE: https://pure.mpg.de/cone/journals/resource/2053-1591