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  Laser multiphoton ionization spectrum of AlCH3 radicals formed by UV excimer laser photolysis of gaseous TMA at 248 nm and 193 nm.

Zhang, Y., & Stuke, M. (1988). Laser multiphoton ionization spectrum of AlCH3 radicals formed by UV excimer laser photolysis of gaseous TMA at 248 nm and 193 nm. Japanese Journal of Applied Physics, 27(2): 7. doi:10.1143/JJAP.27.L1349.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-002D-BD27-E Version Permalink: http://hdl.handle.net/11858/00-001M-0000-002D-BD2B-6
Genre: Journal Article

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 Creators:
Zhang, Y.1, Author              
Stuke, M.1, Author              
Affiliations:
1Abteilung Laserphysik, MPI for biophysical chemistry, Max Planck Society, ou_578547              

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Language(s): eng - English
 Dates: 1988-07
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Method: Peer
 Identifiers: DOI: 10.1143/JJAP.27.L1349
 Degree: -

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Title: Japanese Journal of Applied Physics
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: -
Pages: 3 Volume / Issue: 27 (2) Sequence Number: 7 Start / End Page: - Identifier: -