Elementary Surface Processes during Growth of a-C:H Films

von Keudell, A.; Hopf, C.; Meier, M.; Schwarz-Selinger, T.; Jacob, W.

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Elementary Surface Processes during Growth of a-C:H Films

von Keudell, A., Hopf, C., Meier, M., Schwarz-Selinger, T., & Jacob, W. (2003). Elementary Surface Processes during Growth of a-C:H Films. Talk presented at ASEVA Workshop 14: Reactive Plasmas - Physical and Chemical Processes in Reactive Hydrocarbon Plasmas in Contact with Surfaces. Avila. 2003-07-22 - 2003-07-25.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-002E-943B-C Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-002E-943C-A

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Urheber:
von Keudell, A.^{1, 2}, Autor
Hopf, C.^{1, 2}, Autor
Meier, M.^{1, 2}, Autor
Schwarz-Selinger, T.^{1, 2}, Autor
Jacob, W.^{1, 2}, Autor

Affiliations:
1Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society, ou_2074325
2Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288