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  Elementary Surface Processes during Growth of a-C:H Films

von Keudell, A., Hopf, C., Meier, M., Schwarz-Selinger, T., & Jacob, W. (2003). Elementary Surface Processes during Growth of a-C:H Films. Talk presented at ASEVA Workshop 14: Reactive Plasmas - Physical and Chemical Processes in Reactive Hydrocarbon Plasmas in Contact with Surfaces. Avila. 2003-07-22 - 2003-07-25.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-002E-943B-C Version Permalink: http://hdl.handle.net/11858/00-001M-0000-002E-943C-A
Genre: Talk

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 Creators:
von Keudell, A.1, 2, Author              
Hopf, C.1, 2, Author              
Meier, M.1, 2, Author              
Schwarz-Selinger, T.1, 2, Author              
Jacob, W.1, 2, Author              
Affiliations:
1Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society, ou_2074325              
2Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288              

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Language(s): eng - English
 Dates:
 Publication Status: Not specified
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 112685
 Degree: -

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Title: ASEVA Workshop 14: Reactive Plasmas - Physical and Chemical Processes in Reactive Hydrocarbon Plasmas in Contact with Surfaces
Place of Event: Avila
Start-/End Date: 2003-07-22 - 2003-07-25
Invited: Yes

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