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  A Microscopic Model for Chemical Sputtering of Carbon

Jacob, W., Hopf, C., Schlüter, M., & Schwarz-Selinger, T. (2004). A Microscopic Model for Chemical Sputtering of Carbon. Poster presented at 16th International Conference on Plasma Surface Interactions in Controlled Fusion Devices (PSI 16), Portland, Maine.

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 Creators:
Jacob, W.1, 2, Author              
Hopf, C.1, 2, Author              
Schlüter, M.3, Author              
Schwarz-Selinger, T.1, 2, Author              
Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288              
2Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society, ou_2074325              
3External Organizations, ou_persistent22              

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Language(s): eng - English
 Dates:
 Publication Status: Not specified
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 199232
 Degree: -

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Title: 16th International Conference on Plasma Surface Interactions in Controlled Fusion Devices (PSI 16)
Place of Event: Portland, Maine
Start-/End Date: 2004-05-24 - 2004-05-28

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