A Microscopic Model for Chemical Sputtering of Carbon

Jacob, W.; Hopf, C.; Schlüter, M.; Schwarz-Selinger, T.

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A Microscopic Model for Chemical Sputtering of Carbon

Jacob, W., Hopf, C., Schlüter, M., & Schwarz-Selinger, T. (2004). A Microscopic Model for Chemical Sputtering of Carbon. Poster presented at 16th International Conference on Plasma Surface Interactions in Controlled Fusion Devices (PSI 16), Portland, Maine.

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Item Permalink: https://hdl.handle.net/21.11116/0000-0000-0BD1-8 Version Permalink: https://hdl.handle.net/21.11116/0000-0000-0BF0-5

Genre: Poster

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Creators:
Jacob, W.^{1, 2}, Author
Hopf, C.^{1, 2}, Author
Schlüter, M.³, Author
Schwarz-Selinger, T.^{1, 2}, Author

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
2Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society, ou_2074325
3External Organizations, ou_persistent22

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Language(s): eng - English

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Publication Status: Not specified

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Identifiers: eDoc: 199232

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Title: 16th International Conference on Plasma Surface Interactions in Controlled Fusion Devices (PSI 16)

Place of Event: Portland, Maine

Start-/End Date: 2004-05-24 - 2004-05-28

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