A quantitative model for chemical sputtering of carbon materials

Jacob, W.

Local TagsRelease HistoryDetailsSummary

A quantitative model for chemical sputtering of carbon materials

Jacob, W. (n.d.). A quantitative model for chemical sputtering of carbon materials.

Item is Released

show all hide all

Basic

show hide

Item Permalink: https://hdl.handle.net/21.11116/0000-0000-0C04-F Version Permalink: https://hdl.handle.net/21.11116/0000-0000-0C05-E

Genre: Talk

Files

show Files

Locators

show

Creators

show

hide

Creators:
Jacob, W.^{1, 2}, Author

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
2Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society, ou_2074325

Content

show

Details

show

hide

Language(s): eng - English

Dates:

Publication Status: Not specified

Pages: -

Publishing info: -

Table of Contents: -

Rev. Type: -

Identifiers: eDoc: 204064

Degree: -

Event

show

Legal Case

show

Project information

show

Source

show