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  Deposition and Erosion of amorphous carbon (a-C:H) films in H and N containing low-temperature laboratory plasmas

Jacob, W., Hopf, C., Schlüter, M., Schwarz-Selinger, T., & Sun, C. (2006). Deposition and Erosion of amorphous carbon (a-C:H) films in H and N containing low-temperature laboratory plasmas. Poster presented at 17th International Conference on Plasma Surface Interactions in Controlled Fusion Devices (PSI 17), Hefei Anhui.

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 Creators:
Jacob, W.1, Author           
Hopf, C.1, 2, Author           
Schlüter, M.3, Author           
Schwarz-Selinger, T.1, Author           
Sun, C.1, Author           
Affiliations:
1Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328              
2Experimental Plasma Physics 4 (E4), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856293              
3External Organizations, ou_persistent22              

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Language(s): eng - English
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 Publication Status: Not specified
 Pages: -
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 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 248095
 Degree: -

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Title: 17th International Conference on Plasma Surface Interactions in Controlled Fusion Devices (PSI 17)
Place of Event: Hefei Anhui
Start-/End Date: 2006-05-22 - 2006-05-26

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