Combined Magnetron Sputtering and Ion Implantation - a High Energy Ion Assisted 
Deposition Method for Producing Nanostructurated Coatings

Ruset, C.; Grigore, E.; Maier, H.; Neu, R.

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Combined Magnetron Sputtering and Ion Implantation - a High Energy Ion Assisted Deposition Method for Producing Nanostructurated Coatings

Ruset, C., Grigore, E., Maier, H., & Neu, R. (2007). Combined Magnetron Sputtering and Ion Implantation - a High Energy Ion Assisted Deposition Method for Producing Nanostructurated Coatings. Talk presented at Materials Science & Technology 2007 Conference. Detroit, MI. 2007-09-16 - 2007-09-20.

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Datensatz-Permalink: https://hdl.handle.net/21.11116/0000-0000-19D0-9 Versions-Permalink: https://hdl.handle.net/21.11116/0000-0000-19D1-8

Genre: Vortrag

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Urheber:
Ruset, C.¹, Autor
Grigore, E.¹, Autor
Maier, H.², Autor
Neu, R.³, Autor

Affiliations:
1National Institute for Laser, Plasma and Radiation Physics, 409 Atomistilor Street, P.O. Box MG-36 Code 077125, Bucharest-Magurele, Romania, ou_persistent22
2Max Planck Society, ou_persistent13
3Tokamak Edge and Divertor Physics (E2), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856308