Chemical sputtering of carbon films by argon ions and molecular oxygen between 
110 and 850 K

Hopf, C.; Schlüter, M.; Jacob, W.

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Chemical sputtering of carbon films by argon ions and molecular oxygen between 110 and 850 K

Hopf, C., Schlüter, M., & Jacob, W. (2007). Chemical sputtering of carbon films by argon ions and molecular oxygen between 110 and 850 K. Talk presented at Physique des Interactions Ioniques et Moleculaires. Universite de Provence, Marseille. 2007-06-25.

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Item Permalink: https://hdl.handle.net/21.11116/0000-0000-1A65-2 Version Permalink: https://hdl.handle.net/21.11116/0000-0000-1A66-1

Genre: Talk

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Creators:
Hopf, C.^{1, 2}, Author
Schlüter, M.³, Author
Jacob, W.⁴, Author

Affiliations:
1Experimental Plasma Physics 4 (E4), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856293
2ITER Technology & Diagnostics (ITED), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856290
3External Organizations, ou_persistent22
4Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328

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Language(s): eng - English

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Identifiers: eDoc: 317869

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Title: Physique des Interactions Ioniques et Moleculaires

Place of Event: Universite de Provence, Marseille

Start-/End Date: 2007-06-25

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