Energy, Temperature, and Flux Dependence of the Chemical Sputtering of Carbon 
Surfaces by Low-energy Ions in the Presence of Atomic Hydrogen

Schlüter, M.; Jacob, W.; Hopf, C.; Schwarz-Selinger, T.

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Energy, Temperature, and Flux Dependence of the Chemical Sputtering of Carbon Surfaces by Low-energy Ions in the Presence of Atomic Hydrogen

Schlüter, M., Jacob, W., Hopf, C., & Schwarz-Selinger, T. (2008). Energy, Temperature, and Flux Dependence of the Chemical Sputtering of Carbon Surfaces by Low-energy Ions in the Presence of Atomic Hydrogen. Poster presented at 18th International Conference on Plasma Surface Interactions in Controlled Fusion Devices (PSI 18), Toledo.

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Datensatz-Permalink: https://hdl.handle.net/21.11116/0000-0000-1BEF-6 Versions-Permalink: https://hdl.handle.net/21.11116/0000-0000-1BF0-3

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Urheber:
Schlüter, M.¹, Autor
Jacob, W.², Autor
Hopf, C.³, Autor
Schwarz-Selinger, T.², Autor

Affiliations:
1External Organizations, ou_persistent22
2Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328
3ITER Technology & Diagnostics (ITED), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856290