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  MEMS analogous micro-patterning of thermotropic nematic liquid crystalline elastomer films using a fluorinated photoresist and a hard mask process

Ditter, D., Chen, W. L., Best, A., Zappe, H., Koynov, K., Ober, C. K., et al. (2017). MEMS analogous micro-patterning of thermotropic nematic liquid crystalline elastomer films using a fluorinated photoresist and a hard mask process. Journal of Materials Chemistry C, 5(47), 12635-12644. doi:10.1039/c7tc03958a.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-002E-A14C-E Version Permalink: http://hdl.handle.net/11858/00-001M-0000-002E-A14D-C
Genre: Journal Article

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 Creators:
Ditter, D., Author
Chen, W. L., Author
Best, Andreas1, Author              
Zappe, H., Author
Koynov, Kaloian1, Author              
Ober, C. K., Author
Zentel, R., Author
Affiliations:
1Dept. Butt: Physics at Interfaces, MPI for Polymer Research, Max Planck Society, ou_1800286              

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Language(s): eng - English
 Dates: 2017
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: DOI: 10.1039/c7tc03958a
 Degree: -

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Title: Journal of Materials Chemistry C
  Other : Journal of Materials Chemistry C: Materials for Optical and Electronic Devices
  Abbreviation : J. Mater. Chem. C
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: London, UK : Royal Society of Chemistry
Pages: - Volume / Issue: 5 (47) Sequence Number: - Start / End Page: 12635 - 12644 Identifier: ISSN: 2050-7526
CoNE: https://pure.mpg.de/cone/journals/resource/2050-7526