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  Control of layer growth by substrate bias

Häberle, E., Kopecki, J., Mutzke, A., Schneider, R., Schulz, A., Walker, M., et al. (2010). Control of layer growth by substrate bias. Poster presented at 37th EPS Conference on Plasma Physics, Dublin.

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Item Permalink: http://hdl.handle.net/21.11116/0000-0000-5543-5 Version Permalink: http://hdl.handle.net/21.11116/0000-0000-5544-4
Genre: Poster

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 Creators:
Häberle, E.1, Author
Kopecki, J.1, Author
Mutzke, A.2, Author              
Schneider, R.2, Author              
Schulz, A.1, Author
Walker, M.1, Author
Stroth, U.3, Author              
Affiliations:
1Institut für Plasmaforschung, Universität Stuttgart, D-70569 Stuttgart, ou_persistent22              
2Stellarator Theory (ST), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856287              
3External Organizations, ou_persistent22              

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Language(s): eng - English
 Dates:
 Publication Status: Not specified
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Method: -
 Identifiers: eDoc: 477348
 Degree: -

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Title: 37th EPS Conference on Plasma Physics
Place of Event: Dublin
Start-/End Date: 2010-06-21 - 2010-06-25

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