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  Erbium oxide thin films deposited by filtered cathodic arc and high-power impulse magnetron sputtering

Koch, F., Houben, A., Lindig, S., & Linsmeier, C. (2012). Erbium oxide thin films deposited by filtered cathodic arc and high-power impulse magnetron sputtering. Poster presented at 13th International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen.

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Item Permalink: http://hdl.handle.net/21.11116/0000-0000-8704-3 Version Permalink: http://hdl.handle.net/21.11116/0000-0000-8705-2
Genre: Poster

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 Creators:
Koch, F.1, Author              
Houben, A.1, Author              
Lindig, S.1, Author              
Linsmeier, Ch.1, Author              
Affiliations:
1Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856327              

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Language(s): eng - English
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 Publication Status: Not specified
 Pages: -
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 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 577327
 Degree: -

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Title: 13th International Conference on Plasma Surface Engineering
Place of Event: Garmisch-Partenkirchen
Start-/End Date: 2012-09-10 - 2012-09-14

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