Erbium oxide thin films deposited by filtered cathodic arc and high-power 
impulse magnetron sputtering

Koch, F.; Houben, A.; Lindig, S.; Linsmeier, Ch.

Local TagsRelease HistoryDetailsSummary

Erbium oxide thin films deposited by filtered cathodic arc and high-power impulse magnetron sputtering

Koch, F., Houben, A., Lindig, S., & Linsmeier, C. (2012). Erbium oxide thin films deposited by filtered cathodic arc and high-power impulse magnetron sputtering. Poster presented at 13th International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen.

Item is Released

show all hide all

Basic

show hide

Item Permalink: https://hdl.handle.net/21.11116/0000-0000-8704-3 Version Permalink: https://hdl.handle.net/21.11116/0000-0000-8705-2

Genre: Poster

Files

show Files

Locators

show

Creators

show

hide

Creators:
Koch, F.¹, Author
Houben, A.¹, Author
Lindig, S.¹, Author
Linsmeier, Ch.¹, Author

Affiliations:
1Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856327

Content

show

Details

show

hide

Language(s): eng - English

Dates:

Publication Status: Not specified

Pages: -

Publishing info: -

Table of Contents: -

Rev. Type: -

Identifiers: eDoc: 577327

Degree: -

Event

show

hide

Title: 13th International Conference on Plasma Surface Engineering

Place of Event: Garmisch-Partenkirchen

Start-/End Date: 2012-09-10 - 2012-09-14

Legal Case

show

Project information

show

Source

show