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  A New Type of Dislocation Mechanism in Ultrathin Copper Films

Balk, T. J., Dehm, G., & Arzt, E. (2002). A New Type of Dislocation Mechanism in Ultrathin Copper Films. In Materials Research Society Symposium - Proceedings (pp. 53-58). doi:10.1557/PROC-695-L2.7.1.

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Item Permalink: http://hdl.handle.net/21.11116/0000-0001-8C6C-9 Version Permalink: http://hdl.handle.net/21.11116/0000-0001-8C6F-6
Genre: Conference Paper

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 Creators:
Balk, Thomas John1, Author              
Dehm, Gerhard1, Author              
Arzt, Eduard1, Author              
Affiliations:
1Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497655              

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Language(s): eng - English
 Dates: 2011-03-212002
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Method: -
 Identifiers: DOI: 10.1557/PROC-695-L2.7.1
 Degree: -

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Title: Materials Research Society Symposium L - Thin Films: Stresses and Mechanical Properties IX
Place of Event: Boston, MA, USA
Start-/End Date: 2001-11-26 - 2001-11-30

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Title: Materials Research Society Symposium - Proceedings
Source Genre: Proceedings
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Affiliations:
Publ. Info: -
Pages: - Volume / Issue: 695 Sequence Number: - Start / End Page: 53 - 58 Identifier: -