Measurement of the Interfacial Shear Strength of Thin Copper Films on Sapphire 
by Microindentation Experiments

Dehm, Gerhard; Raj, Rishi; Rühle, Manfred

doi:10.1557/PROC-403-151

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Measurement of the Interfacial Shear Strength of Thin Copper Films on Sapphire by Microindentation Experiments

Dehm, G., Raj, R., & Rühle, M. (2011). Measurement of the Interfacial Shear Strength of Thin Copper Films on Sapphire by Microindentation Experiments. In Materials Research Symposium Proceedings 1996 (Symposium I – Polycrystalline Thin Films: Structure, Texture, Properties and Applications II) (pp. 151-156). Boston, MA, USA: Materials Research Society. doi:10.1557/PROC-403-151.

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Item Permalink: https://hdl.handle.net/21.11116/0000-0001-998F-2 Version Permalink: https://hdl.handle.net/21.11116/0000-0001-9990-F

Genre: Conference Paper

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Creators:
Dehm, Gerhard¹, Author
Raj, Rishi², Author
Rühle, Manfred³, Author

Affiliations:
1Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497655
2Department of Materials Science and Engineering, Cornell University, Bard Hall, Ithaca, NY, 14853-1501, USA, persistent22
3Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497657

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Language(s): eng - English

Dates: Accepted: 1996Published Online: 2011-02-15Date issued: 2011

Publication Status: Issued

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Identifiers: DOI: 10.1557/PROC-403-151

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Title: 1996 MRS Fall Meeting & Exhibit

Place of Event: Boston, MA, USA

Start-/End Date: 1996-12-02 - 1996-12-06

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Title: Materials Research Symposium Proceedings 1996 (Symposium I – Polycrystalline Thin Films: Structure, Texture, Properties and Applications II)

Source Genre: Proceedings

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Publ. Info: Boston, MA, USA : Materials Research Society

Pages: - Volume / Issue: 403 Sequence Number: - Start / End Page: 151 - 156 Identifier: -