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  Work function dependence of vibrational relaxation probabilities: NO(v=2) scattering from ultrathin metallic films of Ag/Au(111)

Steinsiek, C., Shirhatti, P. R., Geweke, J., Bartels, C., & Wodtke, A. M. (2018). Work function dependence of vibrational relaxation probabilities: NO(v=2) scattering from ultrathin metallic films of Ag/Au(111). The Journal of Physical Chemistry C, 122(18), 10027-10033. doi:10.1021/acs.jpcc.8b01950.

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Item Permalink: http://hdl.handle.net/21.11116/0000-0001-6A25-F Version Permalink: http://hdl.handle.net/21.11116/0000-0001-6A29-B
Genre: Journal Article

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 Creators:
Steinsiek, C.1, Author              
Shirhatti, P. R.1, Author              
Geweke, J.1, Author              
Bartels, C.1, Author              
Wodtke, A. M.1, Author              
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1Department of Dynamics at Surfaces, MPI for Biophysical Chemistry, Max Planck Society, ou_578600              

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 Abstract: We present measurements on the vibrational relaxation of NO(v = 2) scattered from atomically defined thin films of Ag on Au(111). The vibrational relaxation probability is strongly dependent on film thickness, increasing with each of the first three Ag monolayers. We interpret this as the influence of work function which changes with layer thickness. This supports the postulated mechanism of NO vibrational relaxation involving a transient NO- anion.

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Language(s): eng - English
 Dates: 2018-04-192018-05-10
 Publication Status: Published in print
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 Rev. Method: Peer
 Identifiers: DOI: 10.1021/acs.jpcc.8b01950
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Title: The Journal of Physical Chemistry C
Source Genre: Journal
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Pages: - Volume / Issue: 122 (18) Sequence Number: - Start / End Page: 10027 - 10033 Identifier: -