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  Structural evolution in reactive RF magnetron sputtered (Cr,Zr)2O3 coatings during annealing

Landälv, L., Lu, J., Spitz, S., Leiste, H., Ulrich, S., Johansson-Jöesaar, M. P., et al. (2017). Structural evolution in reactive RF magnetron sputtered (Cr,Zr)2O3 coatings during annealing. Acta Materialia, 131, 543-552. doi:10.1016/j.actamat.2017.03.063.

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Item Permalink: http://hdl.handle.net/21.11116/0000-0001-702A-2 Version Permalink: http://hdl.handle.net/21.11116/0000-0001-702D-F
Genre: Journal Article

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 Creators:
Landälv, Ludvig1, 2, Author              
Lu, Jun3, Author              
Spitz, Stefanie4, Author              
Leiste, Harald4, Author              
Ulrich, Sven4, Author              
Johansson-Jöesaar, Mats P.5, 6, Author              
Ahlgren, Mats1, Author              
Göthelid, Emmanuelle1, Author              
Alling, Björn7, 8, Author              
Hultman, Lars8, Author              
Stüber, Michael4, Author              
Eklund, Per3, Author              
Affiliations:
1Sandvik Coromant AB, Stockholm, Sweden, persistent22              
2Thin Film Physics Division, Department of Physics, Chemistry, and Biology (IFM), Linköping University, Linköping, Sweden, persistent22              
3Department of Physics Chemistry, and Biology (IFM), Linköping University, Linköping, Sweden, persistent22              
4Karlsruhe Institute of Technology (KIT), Institute for Applied Materials (IAM), Eggenstein-Leopoldshafen, Germany, persistent22              
5Nanostructured Materials, Department of Physics, Chemistry and Biology (IFM), Linköping University, Linköping, Sweden, persistent22              
6SECO Tools AB, Fagersta, Sweden, persistent22              
7Adaptive Structural Materials (Simulation), Computational Materials Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863339              
8Department of Physics, Chemistry and Biology (IFM), Thin Film Physics Division, Linköping University, Linköping, Sweden, ou_persistent22              

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Free keywords: Coatings; Hardness; Magnetron sputtering; Microstructure; Ternary systems; Transmission electron microscopy; Zirconium alloys, Annealing temperatures; Eskolaite; Micro-structure evolutions; Nucleation and growth; Reactive rf magnetron sputtering; rf-Magnetron sputtering; Structural evolution; Tetragonal structure, Annealing
 Abstract: Reactive RF-magnetron sputtering is used to grow Cr0.28Zr0.10O0.61 coatings at 500 °C. Coatings are annealed at 750 °C, 810 °C, and 870 °C. The microstructure evolution of the pseudobinary oxide compound is characterized through high resolution state of the art HRSTEM and HREDX-maps, revealing the segregation of Cr and Zr on the nm scale. The as-deposited coating comprises α-(Cr,Zr)2O3 solid solution with a Zr-rich (Zr,Cr)Ox amorphous phase. After annealing to 750 °C tetragonal ZrO2 nucleates and grows from the amorphous phase. The ZrO2 phase is stabilized in its tetragonal structure at these fairly low annealing temperatures, possibly due to the small grain size (below ∼30 nm). Correlated with the nucleation and growth of the tetragonal-ZrO2 phase is an increase in hardness, with a maximum hardness after annealing to 750 °C, followed by a decrease in hardness upon coarsening, bcc metallic Cr phase formation and loss of oxygen during annealing to 870 °C. The observed phase segregation opens up future design routes for pseudobinary oxides with tunable microstructural and mechanical properties. © 2017 Acta Materialia Inc.

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Language(s): eng - English
 Dates: 2017-06-01
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Method: Peer
 Identifiers: DOI: 10.1016/j.actamat.2017.03.063
BibTex Citekey: Landälv2017543
 Degree: -

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Title: Acta Materialia
  Abbreviation : Acta Mater.
Source Genre: Journal
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Affiliations:
Publ. Info: Kidlington : Elsevier Science
Pages: - Volume / Issue: 131 Sequence Number: - Start / End Page: 543 - 552 Identifier: ISSN: 1359-6454
CoNE: /journals/resource/954928603100