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  Pipe-diffusion ripening of Si precipitates in Al-0.5% Cu-1%Si thin films

Legros, M., Kaouache, B., Gergaud, P., Thomas, O., Dehm, G., Balk, T. J., et al. (2005). Pipe-diffusion ripening of Si precipitates in Al-0.5% Cu-1%Si thin films. Philosophical Magazine, 85(30), 3541-3552. doi:10.1080/14786430500228374.

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Item Permalink: http://hdl.handle.net/21.11116/0000-0001-80D3-F Version Permalink: http://hdl.handle.net/21.11116/0000-0001-80DA-8
Genre: Journal Article

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 Creators:
Legros, Marc1, Author              
Kaouache, Belkhiri2, Author              
Gergaud, Patrice3, Author              
Thomas, Olivier4, Author              
Dehm, Gerhard5, Author              
Balk, Thomas John5, Author              
Arzt, Eduard5, 6, Author              
Affiliations:
1CEMES-CNRS, 29 rue J. Marvig, 31055 Toulouse, France, ou_persistent22              
2LPMM, ENSAM, Technopole, 4 rue Augustin Fresnel, 57078 Metz, France, persistent22              
3Laboratoire TECSEN, Faculté des Sciences de St. Jérôme, 13397 Marseille, France, persistent22              
4CNRS, IM2NP (UMR 6242), Campus de Saint-Jérôme, Marseille, France, ou_persistent22              
5Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497655              
6Universität Stuttgart, Institut für Metallkunde, ou_persistent22              

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Language(s): eng - English
 Dates: 2005-10-21
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Method: Peer
 Identifiers: eDoc: 242444
DOI: 10.1080/14786430500228374
 Degree: -

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Title: Philosophical Magazine
  Abbreviation : Philos. Mag.
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: Milton Park, Abingdon, England : Taylor & Francis
Pages: - Volume / Issue: 85 (30) Sequence Number: - Start / End Page: 3541 - 3552 Identifier: ISSN: 1478-6435
CoNE: https://pure.mpg.de/cone/journals/resource/954925265237