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  Microstructural size effects on the hardness of nanocrystalline TiN/amorphous-SiNx coatings prepared by magnetron sputtering

Kauffmann, F., Dehm, G., Schier, V., Schattke, A., Beck, T., Lang, S., et al. (2005). Microstructural size effects on the hardness of nanocrystalline TiN/amorphous-SiNx coatings prepared by magnetron sputtering. Thin Solid Films, 473(1), 114-122. doi:10.1016/j.tsf.2004.08.080.

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Item Permalink: http://hdl.handle.net/21.11116/0000-0001-7EAE-F Version Permalink: http://hdl.handle.net/21.11116/0000-0001-7EAF-E
Genre: Journal Article

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 Creators:
Kauffmann, Florian1, Author              
Dehm, Gerhard1, Author              
Schier, Veit2, Author              
Schattke, Alexander3, Author              
Beck, Tobias4, Author              
Lang, Stéphane2, Author              
Arzt, Eduard1, 5, Author              
Affiliations:
1Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497655              
2Walter AG, Derendinger Str. 53, 72072 Tübingen, Germany, persistent22              
3Robert Bosch GmbH, Postfach 10 60 50, 70049 Stuttgart, Germany, persistent22              
4Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497645              
5Universität Stuttgart, Institut für Metallkunde, ou_persistent22              

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Language(s): eng - English
 Dates: 2005-02-01
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Method: Peer
 Identifiers: eDoc: 240307
DOI: 10.1016/j.tsf.2004.08.080
 Degree: -

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Title: Thin Solid Films
  Abbreviation : Thin Solid Films
Source Genre: Journal
 Creator(s):
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Publ. Info: Lausanne, Switzerland, etc. : Elsevier
Pages: - Volume / Issue: 473 (1) Sequence Number: - Start / End Page: 114 - 122 Identifier: ISSN: 0040-6090
CoNE: /journals/resource/954925449792