Channel cracking of β-NiAl thin films on Si substrates

Wellner, Patrick; Kraft, Oliver; Dehm, Gerhard; Andersons, J.; Arzt, Eduard

doi:10.1016/j.actamat.2004.01.023

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Channel cracking of β-NiAl thin films on Si substrates

Wellner, P., Kraft, O., Dehm, G., Andersons, J., & Arzt, E. (2004). Channel cracking of β-NiAl thin films on Si substrates. Acta Materialia, 52(8), 2325-2336. doi:10.1016/j.actamat.2004.01.023.

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Item Permalink: https://hdl.handle.net/21.11116/0000-0001-97F2-3 Version Permalink: https://hdl.handle.net/21.11116/0000-0001-97F3-2

Genre: Journal Article

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Creators:
Wellner, Patrick¹, Author
Kraft, Oliver², Author
Dehm, Gerhard¹, Author
Andersons, J.³, Author
Arzt, Eduard¹, Author

Affiliations:
1Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497655
2Karlsruhe Institute of Technology, Institute for Applied Materials, Engelbert-Arnold-Strasse 4, Karlsruhe, Germany, ou_persistent22
3Institute of Polymer Mechanics, Riga, Latvia, persistent22

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Free keywords: MPI für Metallforschung; Abt. Arzt;

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Language(s): eng - English

Dates: Date issued: 2004-05-03

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 175371
DOI: 10.1016/j.actamat.2004.01.023

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Title: Acta Materialia

Abbreviation : Acta Mater.

Source Genre: Journal

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Publ. Info: Kidlington : Elsevier Science

Pages: - Volume / Issue: 52 (8) Sequence Number: - Start / End Page: 2325 - 2336 Identifier: ISSN: 1359-6454
CoNE: https://pure.mpg.de/cone/journals/resource/954928603100