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  Vapor phase deposition and growth of polyimide films on copper

Grunze, M., Baxter, J., Kong, C., Lamb, R., Unertl, W., & Brundle, C. (1988). Vapor phase deposition and growth of polyimide films on copper. AIP Conference Proceedings, 167(1), 355-375. doi:10.1063/1.37166.

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AIPConferenceProc_167_1988_355.pdf (Any fulltext), 805KB
 
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Grunze, M.1, Author           
Baxter, J.P., Author
Kong, C.W., Author
Lamb, R.N., Author
Unertl, W.N., Author
Brundle, C.R., Author
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1Cellular Biophysics, Max Planck Institute for Medical Research, Max Planck Society, ou_2364731              

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 Abstract: The formation of thin polyimide films from vapor phase deposited 4,4 Oxydianiline (ODA) and Pyromellitic dianhydride (PMDA) was studied by X‐ray photoelectron spectroscopy and vibrational spectroscopies. Codeposition of ODA and PMDA onto polycrystalline copper substrates at room temperature, follyowed by heating in vacuum, led to polymerization and the formation of thermall stable (T≤723 K) polyimide films. Films with thicknesses ranging from ultra‐thin (12–30 Å) to several hundred nanometers thick were prepared by this method. Adhesion of the polymer to the surface involve chemical bonding to fragments of PMDA and ODA initially chemisorbed on the clean metal surface.

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Language(s): eng - English
 Dates: 2008-07-231988
 Publication Status: Issued
 Pages: 21
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 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1063/1.37166
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Title: AIP Conference Proceedings
  Abbreviation : AIP Conf. Proc.
Source Genre: Journal
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Publ. Info: Melville, NY : AIP Publishing
Pages: - Volume / Issue: 167 (1) Sequence Number: - Start / End Page: 355 - 375 Identifier: ISSN: 0094-243X
CoNE: https://pure.mpg.de/cone/journals/resource/954928528968